Download Synopsys Sentaurus TCAD N-2017.09 full license
Synopsys Sentaurus TCAD full crack license download and Sentaurus is a suite of TCAD tools
which simulates the fabrication, operation and reliability of semiconductor devices. Te Sentaurus
simulators use physical models to represent the wafer fabrication steps and device operation, thereby
allowing the exploration and optimization of new semiconductor devices.
Te Sentaurus TCAD tools work seamlessly and can be combined into complete simulation flows in 2-D and 3-D. Sentaurus TCAD supports silicon and compound semiconductor technologies, covering a broad range of semiconductor applications.
Key Applications of Synopsys Sentaurus TCAD:
- CMOS, FinFET
- Memory (DRAM, NVM)
- Power Devices (Si, SiC, GaN)
- RF Devices (GaAs, InP, GaN)
- Optoelectronics (CIS, Solar Cells, Photodetectors)
- BEoL Reliability
- Reduces technology development time and cost
- Supports fast prototyping, development, and optimization of a broad spectrum
of semiconductor technologies with comprehensive physics-based processmodeling capabilities - Provides insight into advanced physical phenomena through self-consistent
multidimensional modeling capabilities, improving device design, yield, and reliability - Provides full-flow 3-D process and device simulation flows, with advanced
structure generation, meshing and numerics
By simulating the process flow and device operation before any wafers are processed and during wafer-based process optimization, TCAD reduces the number of engineering wafers, saving time and money. Morever, Sentaurus TCAD simulations provide engineers with important insights on the behavior of
semiconductor devices which can lead to new device concepts.
Sentaurus Topography includes models for the following deposition processes:
- Physical vapor deposition (PVD)
- Chemical vapor deposition (CVD)
- Plasma-enhanced chemical vapor deposition (PECVD)
- Low-pressure chemical vapor deposition (LPCVD)
- High-density plasma (HDP) deposition
- Atmospheric pressure chemical vapor deposition (APCVD)
- Spin coating and reflow
Etching processes that can be simulated in Sentaurus Topography include:
- Wet etch
- Hemispherical etch
- Reactive ion etch (RIE)
- Ion-enhanced etch
- Ion milling
- High-density plasma (HDP) etching
- Chemical-mechanical polishing (CMP)
Synopsys Sentaurus TCAD software details:
- Supported operating systems: Linux x86-x64
- File size: 8.27 GB
- Installation Help: Step by step with screenshots in English
- Crack: full crack (unlimited system)
